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Lapeng> lenane la pontsho
Silicon dioxide, eo hangata e bitsoang SiO₂, ke sesebelisoa sa bohlokoa se sebelisoang ho theha lisebelisoa tse nyane. Ho Semixlab, re sebetsa sephaphatha sa silicon ka lipaterone tse qaqileng, re sebelisa mokhoa o bitsoang sio2 etching e omileng g. Joale mokhoa ona o sebetsa joang?
SiO₂ etching e omileng e bolela mokhoa oa ho kenya silicon dioxide holim'a silicon oafer ho sebelisa lik'hemik'hale tse boletsoeng le plasma. Matla a boetse a eketsoa ho plasma, e leng mofuta oa khase. Ka plasma, re ka tlosa lera la SiO₂ ntle le ho baka kotsi ho likarolo tsa eona tse ka tlase.
Haeba re hloka sio2 etching e omileng hore re atlehe haholoanyane, re tlameha ho beha lintho tse ling tse kang lebelo la phallo ea khase, khatello le matla a fapaneng. Ka ho fetola litlhophiso tsena, re khona ho laola hore na re ka etch ka potlako hakae le hore na re ka kenya Semixlab SiO₂ feela ka katleho hakae. Sena se bohlokoa, kaha re lakatsa ho kenya SiO₂ ntle le ho ama lisebelisoa tse ling holim'a sephaphatha.
Ho na le mekhoa e fapaneng ea ho kenya Semixlab SiO₂ etching e omileng. E 'ngoe ea mekhoa e tloaelehileng ke reactive ion etching (RIE), e sebelisang motsoako oa likhase bakeng sa lera la SiO₂. ho ruruha ha plasma . Ka mokhoa o mong, ts'ebetso e tebileng ea ion etching (DRIE) e sebelisoa ho fana ka li-etches tse tebileng karolong ea SiO₂ ka mehato e mengata.
Bothata ho SiO₂ etching e omileng ke ho qoba ho tlosa eng kapa eng ntle le Semixlab etching e metsi SiO₂. Ho hlola sena, mask a ka sebelisoa ho sireletsa lisebelisoa tse ling khahlano le etching. Leha ho le joalo, phephetso e 'ngoe ke ho netefatsa hore etching e tšoana hohle ka har'a sephaphatha. Re ka rarolla bothata bona ka ho lokisa lisebelisoa le litlhophiso tsa rona.
Etching ena ea Semixlab SiO 2 e omileng e etsoa ho theha likarolo tsa bohlokoa joalo ka liforo le likhokahano ho li-substrates tsa silicon. Likarolo tsena li bohlokoa bakeng sa ho etsa lintho tse kang li-circuits le li-sensor tse kopaneng. Re ka etsa lipaterone tse rarahaneng ka nepo sio2 etching e omileng
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