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Lesale le tiileng la SiC Focus bakeng sa Etching
Solid SiC Focus Ring ke karolo ea bohlokoa lits'ebetsong tse tsoetseng pele tsa semiconductor plasma etching. E etselitsoe ho pota-pota moeli oa liphaephe nakong ea etching, e laola kabo ea plasma le ho ts'oana ha lebala la motlakase, e netefatsa hore li-profiles tse sa fetoheng ho potoloha sebaka sohle sa wafer. E entsoe ka bohloeki bo phahameng, botenya ba silicon carbide (SiC), selikalikoe sena sa ho tsepamisa maikutlo se fana ka khanyetso e phahameng ea khoholeho ea plasma, conductivity e ntle ea mocheso, le botsitso bo ikhethang ba sebopeho, e leng se etsang hore e be se loketseng bakeng sa lits'ebetso tsa plasma etching (ICP, RIE, DRIE).
Tlhaloso
The Solid SiC Focus Ring for Etching from Semixlab e kopanya lisebelisoa tse tsoetseng pele, boenjiniere bo nepahetseng, le ts'ebetso e netefalitsoeng ea ts'ebetso. E etselitsoe ho hanyetsa plasma e phahameng le tšilafalo e fokolang, e netefatsa ho tšoana ho holimo, bophelo bo bolelele ba ts'ebeletso, le ts'ebetso e tsitsitseng ea lisebelisoa libakeng tse thata tsa etching.
songolo
Sebopeho sa Lintho le Lintho tsa Bohlokoa
Semixlab's Solid SiC Focus Ring e entsoe ka SiC ea sintered e phahameng ka ho fetisisa e nang le bohloeki bo ikhethang le microstructure e laoloang.
Lintho tsa mantlha tsa 'mele li kenyelletsa:
| Lintho tsa 'mele tsa Solid SiC | |||
| segokanyipalo | 3.21 | g / cm3 | |
| Ho hanyetsa Motlakase | 102 | Ω/cm | |
| Matla a Flexural | 590 | MPa | (6000kgf/cm2) |
| Modulus ea Bacha | 450 | GPA | (6000kgf/mm2) |
| Vickers Hardness | 26 | GPA | (2650kgf/mm2) |
| CTE(RT-1000℃) | 4.0 | x10-6/K | |
| Thermal Conductivity(RT) | 250 | W / mK | |
Mehaho ena e netefatsa ts'ebetso e tsitsitseng le e ka phetoang tlas'a maemo a thata a etching.
dikopo
Likopo ho Mekhoa ea ho Etching ea Semiconductor
1. High-Density Plasma Etching (ICP / RIE)
Reng ea ho tsepamisa maikutlo ea SiC e tsitsisa sekhahla sa plasma le kabo ea masimo a motlakase haufi le moeli oa li-wafer, ka mokhoa o atlehileng o fokotsa ho ts'oara le ho ntlafatsa ho ts'oana hoa bohlokoa (CD). Khanyetso ea eona e matla ea khoholeho e eketsa bophelo ba ts'ebeletso leha e le tlas'a ts'ebeliso e phahameng ea matla a ion.
2. Deep Reactive Ion Etching (DRIE)
Nakong ea ts'ebetso ea DRIE-e tloaelehileng ho MEMS le tlhahiso ea lisebelisoa tsa matla-Solid SiC Focus Ring e mamella bombardment ea ion khafetsa le ho beoa ha polymer ntle le deformation. Ho hlahisa likaroloana tsa eona tse tlase ho kenya letsoho ho chai e phahameng le ho fokotsa linako tsa tlhokomelo.
3. Fluorine- le Chlorine-Based Etch Environments
Ho se sebetse ha lik'hemik'hale tsa SiC ho thibela ho itšoara ka likhase tsa plasma tse thehiloeng ho halogen (SF₆, CF₄, Cl₂, BCl₃), ho fana ka botsitso ba nako e telele le ho sireletsa kamore hore e se ke ea silafatsoa kapa ho senyeha ha tšepe.
4. Ho Etching ka Matla a Phahameng le Nako e telele
E na le thepa e ntle ea taolo ea mocheso, SiC e hlakola mocheso hantle ho tsoa ho etching ea nako e telele e matla, e boloka botšepehi ba mochini le ho nepahala ha maemo leha e le tlas'a libaesekele tse matla tsa mocheso.
Molemo oa Khatello
Melemo ea Semixlab ea Tekheniki
1. Advanced Material Engineering
Semixlab leverages e nepahetseng ea sintering le theknoloji ea phofo ea SiC e phahameng haholo, e finyellang bongata bo ikhethang ba thepa le ho tšoana ha microstructural. Karolo e 'ngoe le e' ngoe e etsoa ka mochine oa CNC le ho belisoa ha seipone, ho netefatsa geometry e nepahetseng le ho fokotsa tšitiso ea plasma.
2. E Feletseng Customization bokgoni
Re fana ka mehele e etselitsoeng ho tsepamisa mohopolo e etselitsoeng ho lekana li-platform tse fapaneng tsa OEM etching (LAM, TEL, AMAT, Oxford, joalo-joalo). Geometry, conductivity, le botenya li ka ntlafatsoa ho latela tikoloho ea plasma ea hau le boholo ba wafer (200 mm / 300 mm / 450 mm).
3. Teko e Matla ea Boleng
Likarolo tsohle tsa SiC li lekoa tlas'a maemo a thata, a mocheso le a plasma-resistance, ho kenyelletsa:
● Tekanyetso le porosity netefatso
● Ketsiso ea khoholeho ea plasma le tlhahlobo e potlakileng ea moaparo
● Tlhahlobo ea ho ba mahoashe holim'a metsi (Ra ≤ 0.05 μm)
● Khatello ea mocheso le setifikeiti sa flatness
Semixlab ke moetsi ea ka sehloohong oa lisebelisoa tsa silicon carbide (SiC) tsa high-purity silicon carbide (SiC) Chaena, e sebetsanang le li-rings tsa Solid SiC Focus tse tsoetseng pele tse tsoetseng pele. E etselitsoe ho hanyetsa plasma e ikhethang, botsitso ba mocheso, le ho nepahala ha tekanyo, selikalikoe se seng le se seng se tsepamisitseng maikutlo se tiisa kabo e tšoanang ea plasma le taolo e phahameng ea profil ea etch.
Bakeng sa meralo ea moetlo, lipuisano tsa tekheniki, kapa tlhahlobo ea sampole, ka kopo ikopanye le litsebi tsa rona tsa lisebelisoa tsa semiconductor.
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