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CVD Tantalum Carbide (TaC) Coating
Poleiti ea Tšehetso ea Lipedestal tse koahetsoeng ka TaC
Poleiti ea Tšehetso ea Lipedestal tse koahetsoeng ka TaC

Poleiti ea Tšehetso ea Lipedestal tse koahetsoeng ka TaC


Semixlab TaC Coated Pedestal Support Plate ke karolo ea sebopeho e sebetsang hantle e etselitsoeng li-reactor tsa semiconductor epitaxy le litsamaiso tsa ho beha mocheso o phahameng. Karolo ena e etsoa ho sebelisoa substrate ea graphite e hloekileng haholo e kopantsoeng le sekoahelo se teteaneng sa CVD tantalum carbide (TaC) se sireletsang substrate ea graphite likhase tse mabifi tsa ts'ebetso le mocheso o feteletseng. Lipoleiti tsa Tšehetso tsa Semixlab TaC Coated Pedestal li sebelisoa haholo ho li-reactor tsa SiC epitaxy, litsamaisong tsa GaN MOCVD, le lisebelisoa tse tsoetseng pele tsa CVD tsa semiconductor. Re labalabela ho fumana lipotso tsa hau neng kapa neng.

Tlhaloso

Poleiti ea Tšehetso ea Pedestal e Koahetsoeng ea TaC e sebetsa e le karolo ea bohlokoa ea sebopeho ho li-reactor tsa epitaxial tsa semiconductor tse mocheso o phahameng. E etselitsoe ho fana ka tšehetso e tsitsitseng ea mechini bakeng sa li-substrate le li-base ha ka nako e ts'oanang e boloka botsitso bo ikhethang ba lik'hemik'hale le mocheso tlas'a maemo a feteletseng a ts'ebetso.

Karolo ena e sebelisa substrate ea graphite e hloekileng haholo e kopantsoeng le seaparo se teteaneng sa CVD tantalum carbide (TaC). Sebopeho sena se kopaneng se sebelisa bokhoni bo phahameng ba graphite le ho tsamaisa mocheso hammoho le khanyetso e ikhethang ea TaC ea mocheso o phahameng le botsitso ba lik'hemik'hale.

Lipoleiti tsa tšehetso tsa substrate tse koahetsoeng ka Semixlab TaC li sebelisoa haholo lisebelisoa tse tsoetseng pele tsa tlhahiso ea semiconductor, ho kenyeletsoa litsamaiso tsa SiC epitaxial, li-reactor tsa GaN MOCVD, le li-reactor tsa CVD tse nang le mocheso o phahameng. Ka har'a litsamaiso tsena, botsitso ba sebopeho, ho hanyetsa mafome, le taolo ea tšilafalo li bohlokoa bakeng sa ho boloka tlhahiso e tsitsitseng ea wafer.

Mesebetsi ho Semiconductor Epitaxial Reactors

Ka hare ho disebediswa tsa epitaxial tsa semiconductor, dikopano tsa tshehetso di jara substrate le wafer nakong ya ditshebetso tsa kgolo ya mocheso o phahameng. Poleiti ya tshehetso e sebetsa e le karolo ya bohlokwa ya sebopeho ka hara kopano ena.

Mosebetsi oa eona oa mantlha ke ho fana ka tšehetso e tsitsitseng ea mechini bakeng sa sebopeho sa substrate, ho netefatsa hore likarolo tsa bohlokoa tsa reactor li behiloe hantle nakong ea ts'ebetso.

Kaha lits'ebetso tsa epitaxial hangata li sebetsa mochesong o fetang 1000°C ho isa ho 1600°C, esita le phetoho e nyane ea sebopeho kapa ho se lumellane hantle ho ka ama hampe:

● Ho tšoana ha mocheso oa reactor

● Kabo ea phallo ea khase

● Ho tsitsa ha kholo ea lera la Epitaxial

Ka ho boloka botsitso ba mechini ba sebopeho sa substrate, TaC Coated Pedestal Support Plate e thusa ho boloka botsitso ba mocheso le ba geometri ho pholletsa le tikoloho ea karabelo—e leng ea bohlokoa bakeng sa ho fihlela kholo e ts'oanang ea epitaxial ho pholletsa le wafer.

songolo
Thepa ea 'mele ea ho roala ha TaC
segokanyipalo 14.3 (g/cm³)
Essivity e khethehileng 0.3
Coefficient ea mocheso oa mocheso 6.3*10-6/K
Ho thatafala (HK) 2000 HK
itoanela hoo ho 1 × 10-5 Ohm*cm
Thermal botsitso <2500 ℃
Boholo ba graphite bo fetoha -10 ~ 20um
Ho roala botenya ≥20um boleng bo tloaelehileng (35um±10um)
dikopo

Liketso tse tloaelehileng

Lipoleiti tsa tšehetso tsa motheo tse koahetsoeng ka Semixlab TaC li sebelisoa haholo lisebelisoa tse tsoetseng pele tsa ts'ebetso ea semiconductor, ho kenyeletsoa:

● Li-reactor tsa SiC epitaxial bakeng sa tlhahiso ea semiconductor ea matla

● Mekhoa ea GaN le ea LED ea MOCVD

● Li-reactor tsa kholo ea CVD le epitaxial tse nang le mocheso o phahameng

● Mekhoa e tsoetseng pele ea ho boloka li-semiconductor

Molemo oa Khatello

Melemo ea Litšebeliso tsa Epitaxy tsa Mocheso o Phahameng

Ho Tsitsisa Mocheso o Phahameng ka ho Ikhethang: TaC e na le ntlha e phahameng haholo ea ho qhibiliha (hoo e ka bang 3880°C), e leng se etsang hore e tšoanelehe hantle bakeng sa maemo a mocheso a hlokang tlhokomelo ka har'a li-reactor tsa epitaxial. Seaparo sena se boloka botsitso ba sebopeho le botsitso ba bokaholimo nakong ea ts'ebetso e telele ea mocheso o phahameng.

Superior Corrosion Resistance: Mekhoa ea kholo ea Epitaxial hangata e kenyelletsa likhase tse arabelang joalo ka hydrogen, ammonia le metsoako e nang le chlorine. Liaparo tsa TaC li bontša khanyetso e ikhethang tikolohong ena ea lik'hemik'hale, e thibelang ho senyeha ha likaroloana tsa graphite.

Tšilafalo e Fokolitsoeng ea Likaroloana: Ho hlahisa dikarolwana ke taba ya bohlokwa tlhahisong ya di-semiconductor. Seaparo sa TaC se teteaneng, se tshwanang se fokotsa kgoholeho ya mobu le ho phatloha ha metsi, se thusa ho boloka tikoloho ya reactor e hlwekile haholo le ho sireletsa boleng ba wafer.

Nako e Atolositsoeng ea Karolo ea Bophelo: Ka ho sireletsa di-substrate tsa graphite ho mafome a mocheso o phahameng le ho senyeha ha mechini, dikoahelo tsa TaC di atolosa haholo bophelo ba tshebeletso ya di-plate tsa tshehetso ya substrate. Sena se fokotsa kgafetsa ya tlhokomelo ditsing tsa tlhahiso ya di-semiconductor mme se eketsa nako ya tshebetso ya disebediswa ka kakaretso.

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