Lesale le koahetsoeng la TaC bakeng sa SiC Epitaxial Reactor

Li-reactor tsa epitaxial tsa silicon carbide, mocheso oa ts'ebetso hangata o feta 1600 °C tlas'a sepakapaka se nang le haedrojene e senyang haholo le chlorine. Ts'ebetso ea likarolo tsa taolo ea moeli le moeli e ama ka kotloloho boleng ba lera la epitaxial, botsitso ba chai, le nako ea ho sebetsa ha lisebelisoa. Masale a koahelang a tantalum carbide (TaC) a Semixlab a entsoe ka ho khetheha ho fihlela litlhoko tsena tse hlokang tlhokomelo libakeng tsa tlhahiso ea bongata. Masale ana a sebetsa e le likarolo tsa bohlokoa tse sebetsang tsa mocheso o phahameng bakeng sa li-reactor tsa epitaxial tsa SiC, ho netefatsa botsitso ba ts'ebetso ea nako e telele, kholo e ts'oanang ea epitaxial, le bohloeki ba reactor.

Mekhoa ea SiC epitaxy, mehele ea ho roala ea tantalum carbide (TaC) e behiloe haufi le mathōko a wafer kapa libakeng tsa phetoho ea reactor bakeng sa phallo ea mocheso le khase. Mosebetsi oa tsona oa mantlha ke ho tsitsisa maemo a mocheso oa lehae le boitšoaro ba karabelo ea mouoane mathōkong a wafer—libaka tse kotsing ea ho ba le ho se laolehe ha likokoana-hloko le ho se tšoane ha mathōko. Ka ho hlalosa meeli ea karabelo ka nepo le ho hatella ho kenngoa ha silicon le carbon ho sa batleheng, mehele ena ea ho roala e ntlafatsa ka katleho ho tšoana ha botenya ba epitaxial le ho tsitsa ha dopant bakeng sa li-wafer tse kholo tsa SiC.

Semixlab e khethile tantalum carbide coating ka lebaka la botsitso ba eona bo ikhethang ba mocheso, ho se sebetse hantle ha lik'hemik'hale, le ho hanyetsa kutu ea halide. Ka ntlha ea ho qhibiliha e fetang 3880 °C le ho lumellana hantle le H₂, HCl, le lik'hemik'hale tse ling tse senyang tse sebelisoang haholo lits'ebetsong tsa silicon carbide epitaxy, TaC e sireletsa substrate e ka tlase ka katleho khoholehong le ho senyeha ha sebopeho. Sebopeho sena sa coating se nang le porosity e phahameng se fokotsa tlhahiso ea likaroloana, se fokotsa kotsi ea mapetso a manyane kapa ho qhetsoha, 'me se netefatsa maemo a tsitsitseng a reactor nakong ea potoloho e telele ea ts'ebetso.

Ha ho bapisoa le ditharollo tsa setso tsa silicon carbide kapa graphite susceptor, ho tsofala ho hoholo le ho hanyetsa mafome ha Tantalum Carbide Coating ho atolosa haholo bophelo ba dikarolo, ka hona ho fokotsa kgafetsa ya tlhokomelo le ho kheloha ha tshebetso ho amanang le ho nkela dikarolo sebaka. Ho ya ka pono ya ditjeo tsa tlhahiso, lesale la Tantalum Carbide Coating le ntlafatsa ho pheta-pheta ha tshebetso le katleho ya ditjeo. Bakeng sa mela ya tlhahiso ya epitaxial e nang le phallo e hodimo le tlhahiso e tswetseng pele ya disebediswa tsa motlakase, botsitso bona bo fetolela ho dihlahiswa tse hodimo, tshebediso e sebetsang hantle ya disebediswa, le ditjeo tse tlase tsa tlhahiso.

Jwalo ka kgwebo e etellang pele theknoloji lefapheng la ditsamaiso tsa epitaxial tsa semiconductor tsa China, Semixlab e na le boiphihlelo bo tebileng mahlaleng a tswetseng pele a ho roala le thepa ya ditsamaiso tsa semiconductor. Lesale la rona le Koahetsweng la TaC bakeng sa SiC Epitaxial Reactor le tiisetswa hore le tla ntshetswa pele le ho hlahiswa tlasa maemo a thata haholo a taolo ya boleng. Semixlab e ntse e ikemiseditse ho fana ka theknoloji e sejoale-joale le ditharollo tsa TaC tse Koahetsweng tse ikgethileng bakeng sa SiC Epitaxial Reactor indastering ya semiconductor. Re labalabela ka tieo ho ba molekane wa hao wa nako e telele Chaena.